SLiM 100

光刻工艺中的挥发性有机化合物（VOC）与无机化合物会引发掩模版缺陷、扫描镜头起雾等严重问题，导致昂贵的光刻设备受损，进而造成良率下降。

Picarro SLiM 100 光刻工艺监测系统是一套 1 ppb 级别的检测系统，将 Picarro 行业领先的腔衰荡光谱（CRDS）分析仪集成至高性能采样系统，专为晶圆厂内 VOC 监测而设计。

SLiM 100 实现 VOC 的实时测量，适用于晶圆厂环境中全天候 24/7 连续运行。该系统是一套高度集成的化学计量解决方案，具备结构稳固、操作简便的特点，非常适合用于大规模工艺监测与控制。

Picarro SLiM 100 可检测多达 10 种对光刻工艺有负面影响的有机化合物，灵敏度高达 1 ppb。同时，该系统还可扩展用于测量浓度低至 ppt 级别的无机分子。

Gas Detected	VOC: Acetic Acid, Acetone, D3 Siloxane, HMDSO, IPA, PGME, TMS, D6 Siloxane, NMP, PGMEA Inorganic (Optional): NH₃, HF, HCl, SO₂, H₂S (Depending on choice of analyzers from table below)
Sampling Line	1/2" OD x 3/8" ID UHP-PFA tubing
Number of Ports	24 or 32
Dimensions	Keyboard Tray Closed 79" (H) × 34" (W) x 38" (D) 2012 mm (H) × 864 mm (W) × 971 mm (D)	Keyboard Tray Open 79" (H) × 34" (W) × 46" (D) 2012 mm (H) x 864 mm (W) × 1172 mm (D)
Weight (without Analyzers)	24 Port: 447 lbs (203 kg) 32 Port: 482 Ibs (218 kg) Add 75 lbs (34 kg) for each analyzer
Power Requirements	220-240 VAC single phase, 50/60 Hz, 20 Amp
Communication	Ethernet TCP/IP, RESTful API
Warranty	12 months
Certifications	CE, SEMI S2
Country of Manufacture	USA

*-VOC (Acetic Acid, Acetone, D3 Siloxane, HMDSO, IPA, PGME, TMS, D6 Siloxane, NMP, PGMEA)

Part Numbers (Other Combinations Available)
SL100-24-EK00	24 port AMC system for NH₃, HF, VOC
SL100-32-K000	32 port AMC system for VOC
SL100-32-AK00	32 port stationary AMC system for NH₃, HF, HCl, VOC

Components/Parts	Actions	Frequency
Zero filter	Replace	Every 6 months
Particulate filter - Analyzer	Replace	Every 6 months
Pump - Analyzer	Preventative Maintenance Rebuild (Diaphragm)	Every 2 years
Fan assemblies - Analyzer	Preventative Maintenance	Every 2 years
External pump - Analyzer	Replace	Every 5 years